Hermetically sealed mems mirror and method of manufacture

ABSTRACT

A method of making a MEMS device including forming a mirror stack on a handle layer, applying a first bonding layer to the mirror stack, and disposing a substrate on the first bonding layer. The handle layer is removed and a second bonding layer is applied. A cap layer is disposed on the second bonding layer. The mirror stack is formed by disposing a silicon layer on the handle layer, disposing a first insulating layer on the silicon layer, etching portions of the first insulating layer, and depositing a first conductive layer on the first insulating layer. The formation also includes depositing a second insulating layer on the first conductive layer, a portion of the second insulating layer to expose a portion of the first conductive layer exposed, and forming a conductive pad on the exposed portion of the first conductive layer.

RELATED APPLICATION

This application is a divisional from U.S. application patent Ser. No.16/591,854, filed Oct. 3, 2019, now U.S. patent Ser. No. 11/675,186,which is a divisional from U.S. patent application Ser. No. 15/245,805,filed on Aug. 24, 2016, now U.S. patent Ser. No. 10/473,920, thecontents of which are incorporated by reference in their entireties.

TECHNICAL FIELD

This disclosure relates to MEMS mirrors for scanning or deflecting lightbeams and, in particular, to hermetically sealed MEMS mirror packagesand methods of manufacturing same.

BACKGROUND

Certain devices such as small volume projectors, wafer defect scanners,laser printers, document scanners, projectors and the like often employone or more collimated laser beams that scan across a flat surface in astraight line path. These devices employ tilting mirrors to deflect thebeam to perform the scanning. These tilting mirrors may be, or mayinclude, Micro Electro Mechanical Systems (“MEMS”) devices.

A typical MEMS mirror includes a static portion, called a stator, and arotating portion, called a rotor. The rotor rotates with respect to thestator, and serves as or carries the surface that performs the mirroringoperation. Where electrostatic forces are used to cause the rotation ofthe rotor, drawbacks result from operation in ambient air pressure. Itis thus desirable for the rotor to rotate in a low pressure or vacuumenvironment. Unfortunately, the designs of conventional MEMS mirrorpackages with an internal vacuum environment are complex, and themethods of manufacture even more complex, rendering the cost to producesuch designs prohibitive for use in many scenarios.

Therefore, new designs of MEMS mirror packages with an internal vacuumenvironment, and new ways of manufacturing same, are desirable.

SUMMARY

This summary is provided to introduce a selection of concepts that arefurther described below in the detailed description. This summary is notintended to identify key or essential features of the claimed subjectmatter, nor is it intended to be used as an aid in limiting the scope ofthe claimed subject matter.

A method aspect is directed to a method of making a micro-electromechanical (MEMS) device. The method includes forming a MEMS mirrorstack on a handle layer, applying a first bonding layer to the MEMSmirror stack, and disposing a substrate on the first bonding layer suchthat the MEMS mirror stack is mechanically anchored to the substrate andso as to seal against ingress of environmental contaminants. The methodalso includes removing the handle layer, applying a second bonding layerto the MEMS mirror stack, and disposing a cap layer on the secondbonding layer such that the cap layer is mechanically anchored to theMEMS mirror stack and so as to seal against ingress of environmentalcontaminants.

Forming the MEMS mirror stack on the handle layer may include disposinga silicon layer on the handle layer, disposing a first insulating layeron the silicon layer, etching portions of the first insulating layer,depositing a first conductive layer on the first insulating layer andinto the etched portions thereof, and depositing a second insulatinglayer on the first conductive layer.

Forming the MEMS mirror stack on the handle layer may include removingat least one portion of the second insulating layer, first conductivelayer, and first insulating layer so as to form a lower chamber.

Applying the first bonding layer to the MEMS mirror stack may includeapplying the first bonding layer to the second insulating layer. Thesilicon layer may be processed so as to form a stator, and a rotor maybe associated with the stator and configuring the rotor to rotate withrespect to the stator.

At least one portion of the second insulating layer may be removed so asto expose at least one portion of the first conductive layer, and aconductive pad may be formed on the at least one exposed portion of thefirst conductive layer. A second conductive layer may be deposited onthe silicon layer.

The cap layer may be disposed on the second bonding layer in anenvironment having air pressure substantially at a vacuum.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a top plan view of a movable MEMS mirror.

FIG. 2 is a perspective view showing operation of a movable MEMS mirrorperforming a scanning operation.

FIG. 3 is a cross sectional view of a first design of movable MEMSmirror, in accordance with this disclosure.

FIG. 4 is a cross sectional view of a second design of movable MEMSmirror, in accordance with this disclosure.

FIG. 5 is a cross sectional view of a third design of movable MEMSmirror, in accordance with this disclosure.

FIGS. 6-15 are consecutive cross sectional views of the movable MEMSmirror of FIG. 3 as it progresses through a series of manufacturingsteps, in accordance with this disclosure.

DETAILED DESCRIPTION

One or more embodiments of the present disclosure will be describedbelow. These described embodiments are only examples of the presentlydisclosed techniques. Additionally, in an effort to provide a concisedescription, all features of an actual implementation may not bedescribed in the specification.

When introducing elements of various embodiments of the presentdisclosure, the articles “a,” “an,” and “the” are intended to mean thatthere are one or more of the elements. The terms “comprising,”“including,” and “having” are intended to be inclusive and mean thatthere may be additional elements other than the listed elements.Additionally, it should be understood that references to “oneembodiment” or “an embodiment” of the present disclosure are notintended to be interpreted as excluding the existence of additionalembodiments that also incorporate the recited features. Like referencenumbers in the drawing figures refer to like elements throughout, andreference numbers separated by century, as well as reference numberswith prime notation, may indicate similar elements in other applicationsor embodiments.

First, a sample configuration of a movable MEMS mirror 10 will now bedescribed with reference to FIG. 1 . Thereafter, specific MEMS mirror 10designs and methods of manufacture will be described.

The movable MEMS mirror 10 may be used in devices such as wafer defectscanners, laser printers, document scanners, projectors, andpico-projectors. The movable MEMS mirror includes a stator 12 havinginwardly projecting fingers 13. A rotor 14 is positioned within thestator 12 and has outwardly projecting fingers 15 that interleave withthe inwardly projecting fingers 13 of the stator 12. The rotor 14oscillates about its axis, oscillating its mirror surface with respectto the stator 12.

Either the stator 12 or the rotor 14 is supplied with a periodic signal,such as a square wave, while the other is supplied with a referencevoltage. In the case where the periodic signal has an oscillating squarevoltage, for example, electrostatic forces cause the rotor 14 tooscillate about its axis relative to the stator 12. In the case wherethe periodic signal has an oscillating square current, for example,magnetic forces cause the rotor 14 to oscillate about its axis relativeto the stator 12. Indeed, the movable MEMS mirror 10 may be drivenaccording to any suitable way known to those of skill in the art.

For use in scanning a light beam across a surface, the movable MEMSmirror 10 is driven so that it oscillates at its resonant frequencybetween two set or controllable oscillation limits. Shown in FIG. 2 isthe movable MEMS mirror 10 scanning a light beam across a projectionscreen between two set rotation limits that define an “opening angle” 0of the movable MEMS mirror 10.

With reference to FIG. 3 , a MEMS mirror package 100 having an internalvacuum is now described. The MEMS mirror package 100 includes asubstrate 120, and a first bonding layer 118 on the substrate. A supportlayer 114 that has interconnections 112 formed therein is on the firstbonding layer 118. The interconnections 112 pass through aninterconnection layer 108 on the support layer 114. A stator 130 is onthe interconnection layer 108. A rotor 132 is associated with the stator130 (here, the association being that the rotor 132 is disposed withinopenings in the stator 130). The rotor 132 carries a mirror 122, and aterminal 124 is exposed on a surface of the rotor 132.

The substrate 120 may be any suitable substrate, such as silicon. Thefirst bonding layer 118 may be glass frit, polymeric bonding, or oxide.The support layer 114 and interconnection layer 108 may be any suitabledielectric. The interconnections 112 and terminal 124 may be copper,other metals, doped polysilicon, or other suitable materials. The stator130 and rotor 132 are formed from suitable conductive materials within asupporting silicon layer.

The support layer 114, interconnection layer 108, stator 130, and rotor132 can be collectively referred to as a MEMS mirror stack 101 that isanchored to the substrate 120 by the first bonding layer 118. The firstbonding layer 118 not only mechanically anchors the MEMS mirror stack101 to the substrate, but serves to seal against ingress ofenvironmental contaminants.

A recess 116 is formed within the substrate 120 provides clearance andspace for the mirror 122 to rotate through as the rotor 132 rotates.Since the MEMS mirror stack 101 is sealed against the substrate 120 bythe first bonding layer 118 and an environmental sealing is providedthereby, the recess 116 and MEMS mirror stack 101 define a lower chamber116.

A second bonding layer 119 is on the MEMS mirror stack 101, and servesto mechanically anchor a cap layer 126 thereto. The second bonding layer119 also provides for environmental sealing. The cap layer 126, such asglass, is shaped so as to have a recess 134 therein providing clearanceand space for the mirror 122 to rotate through as the rotor 132 rotates.Since the cap layer is 126 is sealed against the MEMS mirror stack 101by the first bonding layer 118 and an environmental sealing is providedthereby, the recess 134 and MEMS mirror stack 101 define an upperchamber 134. Air pressure within the upper and lower chambers 134, 116is within a threshold of vacuum.

Although the application depicted in FIG. 3 shows the stator 130 androtor 132 being collocated such that the rotor 132 rotates in a planeoccupied by the stator 130, other designs are possible. For example, asshown in the design of FIG. 4 , the stator 130 and rotor 132 may beseparate spaced apart layers, with the support layer 114 in between. Inthis setup, the rotor 132 rotates in a plane not occupied by the stator130, although the fingers of the rotor 132 pass through the stator 130as the rotor 132 rotates.

As shown, the cap layer 126 has a width less than a width of the MEMSmirror stack 101 in at least one direction so as to expose the terminal124 on an upper side of the MEMS mirror stack 101. However, as shown inFIG. 5 , in some applications, the substrate 120 may have a width lessthan that of the MEMS mirror stack 101 in at least one direction so asto expose the terminal 124 on the bottom side of the MEMS mirror stack101.

Manufacture of the MEMS mirror package 100 will now be described withreference to FIGS. 6-15 . Referring initially to FIG. 6 , the startingbuilding block of the MEMS mirror package 100 is a handle layer 102,with an insulator layer 104 formed thereon. Thereafter, a layer ofsilicon 106 is deposited on the insulator layer 104. Then, anotherinsulator layer 108 is deposited on the layer of silicon 106, therebycreating a silicon on insulator (SOI) structure, as shown in FIG. 7 .

Portions 110 of the insulator layer 108 are then etched, as shown inFIG. 8 , and a conductive layer to act as interconnections 112 isdeposited on the insulating layer 108 and into the etched portions 110,as shown in FIG. 9 . Subsequently, an insulating layer 114 is depositedon the insulating layer 108 and the exposed interconnections 112, asshown in FIG. 10 . Next, a portion 116 of the insulating layers 114 and108 are removed so as to form a lower chamber, as shown in FIG. 11 .

Next, a bonding layer 118 is disposed on the insulating layer 114, and asubstrate 120 is placed on the bonding layer 118, as shown in FIG. 12 .The MEMS mirror package 100 at this point is flipped over, and thehandle 102 is removed, yielding the structure shown in FIG. 13 . In somecases, the insulating layer 104 is removed at the same time as thehandle 102, and in some cases it is removed after the handle 102 isremoved.

The mirror 122 itself is then deposited on the silicon layer 106, as isthe contact pad 124, as shown in FIG. 14 . Then, structures for therotor 132 and stator 130 are etched, as shown in FIG. 15 , andthereafter the rotor 132 and stator 130 are either formed or placed.Then, a bonding layer 119 is deposited on the stator 130, and the cap126 is placed. This produces the MEMS mirror package 100 shown in FIG. 3.

The placement of the cap 126, as well as attachment of the substrate120, are performed in an environment having an air pressure that issubstantially a vacuum, thereby producing the upper chamber 134 andlower chamber 116 having an internal vacuum or substantial vacuum. TheMEMS mirror packages 100 shown in FIGS. 4-5 are formed by changing thelayout of the interconnections 112, and by choosing the size of the cap126 selectively, or by selectively removing appropriate portions of thesubstrate 120.

While the disclosure has been described with respect to a limited numberof embodiments, those skilled in the art, having benefit of thisdisclosure, will appreciate that other embodiments can be envisionedthat do not depart from the scope of the disclosure as disclosed herein.Accordingly, the scope of the disclosure shall be limited only by theattached claims.

1. A method of making a micro-electro mechanical system (MEMS) device,comprising: forming a MEMS mirror stack on a handle layer; applying afirst bonding layer to the MEMS mirror stack; disposing a substrate onthe first bonding layer to mechanically anchor the MEMS mirror stack tothe substrate and seal against ingress of environmental contaminants;removing the handle layer; applying a second bonding layer to the MEMSmirror stack; and disposing a cap layer on the second bonding layer tomechanically anchor the cap layer to the MEMS mirror stack and sealagainst ingress of environmental contaminants; wherein forming the MEMSmirror stack comprises: disposing a silicon layer on the handle layer;disposing a first insulating layer on the silicon layer; etchingportions of the first insulating layer; depositing a first conductivelayer on the first insulating layer and into the etched portionsthereof, the first conductive layer deposited so as to have a widthgreater than a width of the substrate in at least one direction;depositing a second insulating layer on the first conductive layer;removing at least one portion of the second insulating layer to exposeat least one portion of the first conductive layer exposed due to thefirst conductive layer having a width greater than the width of thesubstrate in the at least one direction; and forming a conductive pad onthe at least one exposed portion of the first conductive layer andextending away from the MEMS mirror stack opposite the cap layer.
 2. Themethod of claim 1, wherein forming the MEMS mirror stack on the handlelayer further comprises form a lower chamber by removing at least oneportion of the second insulating layer, first conductive layer, andfirst insulating layer.
 3. The method of claim 2, wherein the lowerchamber is formed so as to have air pressure therein within a thresholdof vacuum.
 4. The method of claim 2, wherein applying the first bondinglayer to the MEMS mirror stack comprises applying the first bondinglayer to the second insulating layer.
 5. The method of claim 4, furthercomprising processing the silicon layer so as to form a stator, andassociating a rotor with the stator and configuring the rotor to rotatewith respect to the stator.
 6. The method of claim 1, wherein the caplayer is disposed on the second bonding layer in an environment havingpressure substantially at a vacuum.
 7. The method of claim 1, whereinthe cap layer is formed to have a width less than a width of the MEMSmirror stack in at least one direction.
 8. A method for creating amicro-electro mechanical system (MEMS) device, comprising: forming aMEMS mirror stack on a handle layer by: disposing a silicon layer on thehandle layer; disposing a first insulating layer on the silicon layer;etching portions of the first insulating layer; depositing a firstconductive layer on the first insulating layer and into the etchedportions thereof; and depositing a second insulating layer on the firstconductive layer; anchoring and sealing the MEMS mirror stack to asubstrate using two bonding layers; removing the handle layer; andforming a conductive pad on an exposed portion of the first conductivelayer of the MEMS mirror stack.
 9. The method of claim 8, furthercomprising forming a lower chamber by removing portions of the firstinsulating layer and the first conductive layer.
 10. The method of claim9, wherein the lower chamber is near vacuum.
 11. The method of claim 9,wherein the first bonding layer is applied to the second insulatinglayer.
 12. The method of claim 11, further comprising processing thesilicon layer layer to form a stator, and associating a rotor with thestator.
 13. The method of claim 8, further comprising applying a caplayer on the MEMS mirror stack.
 14. The method of claim 13, wherein theapplying of the cap layer is performed in an environment having pressuresubstantially at vacuum.
 15. The method of claim 13, wherein the caplayer is narrower than the MEMS mirror stack in one direction.
 16. Amethod for making a MEMS device, comprising: forming a MEMS mirror stackon a handle layer; applying a first bonding layer to the MEMS mirrorstack; disposing a substrate on the first bonding layer to mechanicallyanchor the MEMS mirror stack to the substrate and seal againstenvironmental contaminants; removing the handle layer; applying a secondbonding layer to the MEMS mirror stack; and disposing a cap layer on thesecond bonding layer to mechanically anchor the cap layer to the MEMSmirror stack and seal against environmental contaminants.
 17. The methodof claim 16, wherein forming the MEMS mirror stack on the handle layeris performed so as to form a lower chamber.
 18. The method of claim 17,wherein the lower chamber is formed at vacuum.
 19. The method of claim16, wherein the cap layer is disposed on the second bonding layer in anenvironment having pressure substantially at vacuum.
 20. The method ofclaim 16, wherein the cap layer is narrower than the MEMS mirror stackin at least one direction.